PATENTS
Process is employed that involves passing a gas mixture containing < 2 parts by volume of H2 for each part by volume of CO into the inlet end of a reaction chamber, adding further H2 to the reaction mixture at spaced points along the reaction chamber in such amounts that there are < 2 parts by volume of H2 for each part by volume of CO in every part of the reaction chamber, the total volume of H2 supplied to the chamber being substantially 2 times the volume of CO supplied to it. |