3545.     VAN ITTERBEEK, A.  [Relation Between Adsorption and the Catalytic Activity of Metals.]  Mededeel. Koninkl. Viaam. Acad. Wetenschap., Belg., Klasse Wetenschap., vol. 3, No. 10, 1941, pp. 3-20; Chem. Zentralb., 1942, II, p.742; Chem. Abs., vol. 37, 1943, p. 4958.

        On the very pure Ni film the adsorption of H₂ and CO at temperatures up to 500° and pressures below 1 mm. was studied with the help of a thermal-conductivity gage.  At ordinary temperature, activated adsorption of H₂ occurs; at higher temperatures, this increases and is apparently not to be attributed to diffusion adsorption.  Comparison of the H₂ and CO isobars shows that at 167° and 329° the ratio of H₂:CO is 3:1 and at 2 other temperatures the ratio is 2:1, corresponding, respectively, to the synthesis of CH₄ and benzene.  It is concluded that the occurrence of this stoichiometric surface ratio is related to the surface reaction.  On a copper film, neither H₂ nor CO is adsorbed until a small quantity of Th is electrodeposited.  In this instance also, temperatures exist at which the H₂:CO ratio is 3:1 and also those in which it is 2:1.